JPS5625964B2 - - Google Patents

Info

Publication number
JPS5625964B2
JPS5625964B2 JP13974075A JP13974075A JPS5625964B2 JP S5625964 B2 JPS5625964 B2 JP S5625964B2 JP 13974075 A JP13974075 A JP 13974075A JP 13974075 A JP13974075 A JP 13974075A JP S5625964 B2 JPS5625964 B2 JP S5625964B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13974075A
Other languages
Japanese (ja)
Other versions
JPS5263755A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP50139740A priority Critical patent/JPS5263755A/ja
Priority to US05/740,495 priority patent/US4112309A/en
Publication of JPS5263755A publication Critical patent/JPS5263755A/ja
Publication of JPS5625964B2 publication Critical patent/JPS5625964B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/04—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving
    • G01B11/046—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving for measuring width

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
JP50139740A 1975-11-22 1975-11-22 Pattern line width measuring device Granted JPS5263755A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP50139740A JPS5263755A (en) 1975-11-22 1975-11-22 Pattern line width measuring device
US05/740,495 US4112309A (en) 1975-11-22 1976-11-10 Apparatus for measuring the line width of a pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50139740A JPS5263755A (en) 1975-11-22 1975-11-22 Pattern line width measuring device

Publications (2)

Publication Number Publication Date
JPS5263755A JPS5263755A (en) 1977-05-26
JPS5625964B2 true JPS5625964B2 (en]) 1981-06-16

Family

ID=15252262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50139740A Granted JPS5263755A (en) 1975-11-22 1975-11-22 Pattern line width measuring device

Country Status (2)

Country Link
US (1) US4112309A (en])
JP (1) JPS5263755A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012194085A (ja) * 2011-03-17 2012-10-11 Mitsubishi Electric Corp エッジ検出装置

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5483854A (en) 1977-12-16 1979-07-04 Canon Inc Measuring device
JPS54113262A (en) * 1978-02-24 1979-09-04 Hitachi Ltd Mask inspection unit
US4185192A (en) * 1978-03-27 1980-01-22 Frank E. Maddocks, III Alignment system using two photocells directed at each other
US4217491A (en) * 1978-06-29 1980-08-12 Nolan Systems Inc. Counting system for articles conveyed in a stream
US4275966A (en) * 1979-01-18 1981-06-30 Claus Kleesattel Method and apparatus for the measurement of hardness testing indentations
DE3012433C1 (de) * 1980-03-31 1981-10-01 Polygram Gmbh, 2000 Hamburg Vorrichtung zum Zentrieren fuer die Herstellung eines Mittellochs in Platten
SE433200B (sv) * 1980-06-04 1984-05-14 Dagens Nyheters Ab Sett och anordning for att rekna fiskfjellsartat lagda foremal
US4646009A (en) * 1982-05-18 1987-02-24 Ade Corporation Contacts for conductivity-type sensors
JPS58204304A (ja) * 1982-05-24 1983-11-29 Shimadzu Corp 微小硬度計
JPS5999304A (ja) * 1982-11-30 1984-06-08 Asahi Optical Co Ltd 顕微鏡系のレーザ光による比較測長装置
US4639604A (en) * 1983-03-29 1987-01-27 Nippon Kagaku K.K. Method and apparatus for detecting an edge position of a pattern and eliminating overlapping pattern signals
JPS58213205A (ja) * 1983-05-16 1983-12-12 Hitachi Ltd 微小寸法測定装置
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
US5148645A (en) * 1984-02-27 1992-09-22 Georgia-Pacific Corporation Use of fibrous mat-faced gypsum board in shaft wall assemblies and improved fire resistant board
US4663534A (en) * 1984-03-08 1987-05-05 Canon Kabushiki Kaisha Position detecting device utilizing selective outputs of the photodetector for accurate alignment
JPS6189501A (ja) * 1984-10-08 1986-05-07 Hitachi Ltd 境界面測定装置
JPH0726803B2 (ja) * 1984-11-26 1995-03-29 株式会社ニコン 位置検出方法及び装置
US4656358A (en) * 1985-03-12 1987-04-07 Optoscan Corporation Laser-based wafer measuring system
US4664707A (en) * 1985-04-09 1987-05-12 Georgia-Pacific Corporation Fire resistant gypsum composition
US4722866A (en) * 1985-04-09 1988-02-02 Georgia-Pacific Corporation Fire resistant gypsum board
US4748335A (en) * 1985-04-19 1988-05-31 Siscan Systems, Inc. Method and aparatus for determining surface profiles
US4689491A (en) * 1985-04-19 1987-08-25 Datasonics Corp. Semiconductor wafer scanning system
JPH0735964B2 (ja) * 1985-07-09 1995-04-19 株式会社ニコン 間隔測定装置
JPH0641848B2 (ja) * 1985-09-24 1994-06-01 株式会社ニコン エツジ検出装置
US4694153A (en) * 1985-10-29 1987-09-15 California Institute Of Technology Linear array optical edge sensor
JPH0666370B2 (ja) * 1987-04-14 1994-08-24 株式会社東芝 半導体デバイス用外観検査装置
US4782238A (en) * 1987-10-20 1988-11-01 Eastman Kodak Company Apparatus for generating edge position signals for use in locating an address element on a mailpiece
FR2647543B1 (fr) * 1989-05-24 1991-09-06 Micro Controle Procede et dispositif de mesure de largeur de traits a balayage optique
JP2712772B2 (ja) * 1990-07-05 1998-02-16 株式会社ニコン パターン位置測定方法及び装置
JP2717138B2 (ja) * 1990-09-12 1998-02-18 セイコープレシジョン株式会社 センサによる設定方法
US5149978A (en) * 1990-12-07 1992-09-22 Therma-Wave, Inc. Apparatus for measuring grain sizes in metalized layers
US5170047A (en) * 1991-09-20 1992-12-08 Hewlett-Packard Company Optical sensor for plotter pen verification
US5401588A (en) * 1992-12-23 1995-03-28 Georgia-Pacific Resins Inc. Gypsum microfiber sheet material
KR960024689A (ko) * 1994-12-01 1996-07-20 오노 시게오 광학 장치
US5659396A (en) * 1995-06-07 1997-08-19 Electrocom Automation L.P. Dichotomous scan system for detection of edges of objects and overlapped objects having relatively uniform surfaces
JP3445722B2 (ja) * 1997-05-14 2003-09-08 出光石油化学株式会社 表面検査装置および表面検査方法
US7893435B2 (en) * 2000-04-18 2011-02-22 E Ink Corporation Flexible electronic circuits and displays including a backplane comprising a patterned metal foil having a plurality of apertures extending therethrough
JP2002310929A (ja) * 2001-04-13 2002-10-23 Mitsubishi Electric Corp 欠陥検査装置
JP4529327B2 (ja) * 2001-07-25 2010-08-25 株式会社日本自動車部品総合研究所 距離計測方法
US6927864B2 (en) * 2002-08-05 2005-08-09 Xyratex Technology Limited Method and system for determining dimensions of optically recognizable features
US6991755B2 (en) * 2003-04-17 2006-01-31 Northrop Grumman Corporation Syntactic tunnel core
US7190458B2 (en) * 2003-12-09 2007-03-13 Applied Materials, Inc. Use of scanning beam for differential evaluation of adjacent regions for change in reflectivity
US7212293B1 (en) * 2004-06-01 2007-05-01 N&K Technology, Inc. Optical determination of pattern feature parameters using a scalar model having effective optical properties
DE102010022273A1 (de) * 2010-05-31 2011-12-01 Sick Ag Optoelektronischer Sensor zur Detektion von Objektkanten
PL224191B1 (pl) 2012-05-25 2016-11-30 Polska Spółka Inżynierska Digilab Spółka Z Ograniczoną Sposób wyznaczania  wartości wymiaru liniowego obiektu oraz optyczne urządzenie do wyznaczania wymiaru liniowego obiektu
EP2801786B1 (de) 2013-05-08 2019-01-02 Sick AG Optoelektronischer Sensor und Verfahren zur Erkennung von Objektkanten

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH342889A (de) * 1955-11-23 1959-11-30 Hauni Werke Koerber & Co Kg Photoelektrisches Verfahren und Vorrichtung zum Spiegellegen von Zigaretten
US3904293A (en) * 1973-12-06 1975-09-09 Sherman Gee Optical method for surface texture measurement
GB1474191A (en) * 1974-01-21 1977-05-18 Nat Res Dev Measurement of surface roughness

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012194085A (ja) * 2011-03-17 2012-10-11 Mitsubishi Electric Corp エッジ検出装置

Also Published As

Publication number Publication date
US4112309A (en) 1978-09-05
JPS5263755A (en) 1977-05-26

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